ARSENIC IMPLANTATION IN CVD TUNGSTEN SILICIDE

被引：1
|
作者：
HARA, T
TAKAHASHI, H
CHEN, SC
机构：
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1985年 / 88卷 / 02期
关键词：
D O I：
10.1002/pssa.2210880249
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：K131 / K136
页数：6
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