SILICON-NITRIDE THIN-FILMS BY LOW-VOLTAGE REACTIVE ION PLATING - OPTICAL-PROPERTIES AND COMPOSITION

被引：14
|
作者：
BOVARD, BG [1 ]
RAMM, J [1 ]
HORA, R [1 ]
HANSELMANN, F [1 ]
机构：
[1] BALZERS AG, FL-9496 BALZERS, LIECHTENSTEIN
来源：
APPLIED OPTICS | 1989年 / 28卷 / 20期
关键词：
D O I：
10.1364/AO.28.004436
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：4436 / 4441
页数：6
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