SILICON-NITRIDE THIN-FILMS BY LOW-VOLTAGE REACTIVE ION PLATING - OPTICAL-PROPERTIES AND COMPOSITION

被引：14

作者：

BOVARD, BG ^{[1
]}

RAMM, J ^{[1
]}

HORA, R ^{[1
]}

HANSELMANN, F ^{[1
]}

机构：

[1] BALZERS AG, FL-9496 BALZERS, LIECHTENSTEIN

来源：

APPLIED OPTICS | 1989年 / 28卷 / 20期

关键词：

D O I：

10.1364/AO.28.004436

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：4436 / 4441

页数：6

共 50 条

[1] OPTICAL-PROPERTIES OF SILICON-NITRIDE FILMS
SHITOVA, EV
YASNEVA, IA
GENKINA, NA
OPTIKA I SPEKTROSKOPIYA, 1977, 43 (02): : 244 - 248
[2] PROPERTIES OF SILICON-NITRIDE THIN-FILMS OBTAINED BY REACTIVE SPUTTERING
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THIN SOLID FILMS, 1980, 69 (02) : 149 - 155
[3] STRUCTURE AND OPTICAL-PROPERTIES OF PLASMA-DEPOSITED FLUORINATED SILICON-NITRIDE THIN-FILMS
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[4] REACTIVE LOW-VOLTAGE ION PLATING OF ALUMINUM NITRIDE FILMS AND THEIR CHARACTERISTICS
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THIN SOLID FILMS, 1995, 257 (01) : 116 - 124
[5] HYDROGENATION OF SILICON-NITRIDE AND SILICON OXYNITRIDE FILMS DEPOSITED BY REACTIVE SPUTTERING - OPTICAL-PROPERTIES
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[6] EMISSION-SPECTROSCOPY OF REACTIVE LOW-VOLTAGE ION PLATING FOR METAL-OXIDE THIN-FILMS
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[7] TETRAHEDRON-MODEL ANALYSIS OF SILICON-NITRIDE THIN-FILMS AND THE EFFECT OF HYDROGEN AND TEMPERATURE ON THEIR OPTICAL-PROPERTIES
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[8] OPTICAL-PROPERTIES OF REACTIVELY SPUTTERED SILICON-NITRIDE FILMS
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ELIZALDE, E
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VACUUM, 1987, 37 (5-6) : 395 - 397
[9] OPTICAL-PROPERTIES OF TITANIUM NITRIDE THIN-FILMS
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[10] OPTICAL-PROPERTIES OF THIN-FILMS OF ALUMINUM NITRIDE
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