共 50 条
- [21] CALCULATION OF MAXIMUM PERMISSIBLE EXPOSURE LEVELS FOR LASER-RADIATION JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1979, 12 (10): : 922 - &
- [22] CHANGES IN METAL MIRROR REFLECTIVITY ON EXPOSURE TO LASER-RADIATION KVANTOVAYA ELEKTRONIKA, 1978, 5 (02): : 325 - 330
- [23] STAGE OF EXPOSURE BY LASER-RADIATION SOURCE IN PHOTOLITHOGRAPHIC PROCESS ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII, 1981, 26 (01): : 65 - 68
- [24] MECHANISM OF DEVELOPED EVAPORATION OF GLASS ON EXPOSURE TO LASER-RADIATION KVANTOVAYA ELEKTRONIKA, 1977, 4 (03): : 641 - 644
- [25] ON A FATIGUE FAILURE OF GLASSES UPON EXPOSURE TO THE LASER-RADIATION KVANTOVAYA ELEKTRONIKA, 1980, 7 (11): : 2427 - 2431
- [26] STUDY OF DAMAGE TO DIELECTRIC FILMS ON EXPOSURE TO LASER-RADIATION KVANTOVAYA ELEKTRONIKA, 1977, 4 (02): : 413 - 419
- [27] THERMAL EFFECTS ON EXPOSURE OF EYEGROUND TISSUES TO THE LASER-RADIATION KVANTOVAYA ELEKTRONIKA, 1979, 6 (06): : 1296 - 1303
- [28] CHANGES IN EMISSION PROPERTIES OF METAL TARGETS UPON EXPOSURE TO THE REPETITIVELY PULSED LASER-RADIATION KVANTOVAYA ELEKTRONIKA, 1988, 15 (02): : 422 - 427
- [29] INVESTIGATION OF THE EFFECT OF REPEATED EXPOSURE OF ACTIVE LASER GLASSES TO LASER-RADIATION SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1985, 52 (01): : 16 - 18
- [30] A THERMOCAPILLARY MECHANISM OF DEEP MELTING OF MATERIALS BY THE LASER-RADIATION KVANTOVAYA ELEKTRONIKA, 1988, 15 (03): : 622 - 624