VACUUM PYROLYTIC DEPOSITION OF SILICON DIOXIDE

被引:0
|
作者
OROSHNIK.J
KRAITCHM.J
机构
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:C315 / &
相关论文
共 50 条
  • [21] PLASMA DEPOSITION OF SILICON DIOXIDE AND SILICON-NITRIDE FILMS
    VANDEVEN, EPGT
    SOLID STATE TECHNOLOGY, 1981, 24 (04) : 167 - 171
  • [22] VACUUM DEPOSITION OF STOICHIOMETRIC TITANIUM-DIOXIDE FILMS
    KUSHKOV, VD
    ZASLAVSKII, AM
    MELNIKOV, AV
    KOZLOV, IS
    ZVERLIN, AV
    SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1989, 56 (12): : 766 - 767
  • [23] QUASI-MONOLAYER DEPOSITION OF SILICON DIOXIDE
    GASSER, W
    UCHIDA, Y
    MATSUMURA, M
    THIN SOLID FILMS, 1994, 250 (1-2) : 213 - 218
  • [24] DEPOSITION OF SILICON DIOXIDE FILMS AT REDUCED PRESSURE
    ADAMS, AC
    CAPIO, CD
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (06) : 1042 - 1046
  • [25] CHEMICAL VAPOUR DEPOSITION OF SILICON DIOXIDE FILMS
    KESAVAN, R
    RATNAVATI, V
    INDIAN JOURNAL OF TECHNOLOGY, 1969, 7 (09): : 282 - +
  • [26] PHOTOCHEMICAL VAPOR-DEPOSITION IN SILICON DIOXIDE
    PETERS, JW
    ROGERS, HN
    HALL, JT
    YEE, EM
    RHIGER, DR
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C104 - C104
  • [27] DEPOSITION OF PHOSPHORUS DOPED SILICON DIOXIDE FILMS
    KESAVAN, R
    SINGH, MN
    INDIAN JOURNAL OF TECHNOLOGY, 1971, 9 (01): : 5 - &
  • [28] Silicon dioxide deposition in a microwave plasma reactor
    Benissad, N
    Boisse-Laporte, C
    Vallée, C
    Granier, A
    Goullet, A
    SURFACE & COATINGS TECHNOLOGY, 1999, 116 : 868 - 873
  • [29] SILICON DIOXIDE DEPOSITION BY USE OF MICROWAVE PLASMA
    ODA, M
    KINOSHITA, Y
    KOBAYASHI, T
    PLASMA SURFACE ENGINEERING, VOLS 1 AND 2, 1989, : 451 - 456
  • [30] Low temperature silicon dioxide deposition and characterization
    Chatham, Hood
    Mogaard, Martin
    Okuyama, Yoshi
    Treichel, Helmuth
    TRANSISTOR SCALING- METHODS, MATERIALS AND MODELING, 2006, 913 : 99 - +