共 50 条
- [1] MECHANISM OF POWER ABSORPTION UNDER THE UHF VACUUM-PLASMA TREATMENT OF MICROELECTRONIC STRUCTURES PISMA V ZHURNAL TEKHNICHESKOI FIZIKI, 1988, 14 (24): : 2211 - 2214
- [2] EFFECT OF HETEROGENEOUS MAGNETIC-FIELD ON UHF VACUUM-PLASMA TREATMENT IN MICROELECTRONICS PISMA V ZHURNAL TEKHNICHESKOI FIZIKI, 1989, 15 (19): : 73 - 77
- [3] ENERGY ELECTRON-DISTRIBUTION UNDER UHF VACUUM-PLASMA TREATMENT IN MAGNETIC-FIELD PISMA V ZHURNAL TEKHNICHESKOI FIZIKI, 1994, 20 (12): : 62 - 68
- [5] VACUUM-PLASMA BOUNDARY HELICITY INJECTION PHYSICS OF FLUIDS B-PLASMA PHYSICS, 1992, 4 (08): : 2577 - 2588
- [7] Vacuum-Plasma Coatings Based on the Multielement Nitrides METALLOFIZIKA I NOVEISHIE TEKHNOLOGII, 2013, 35 (08): : 1061 - 1084
- [8] On reducing residual stresses in vacuum-plasma coatings Problemy Prochnosti, 2001, (04): : 62 - 68
- [10] Effect of vacuum conditions and plasma concentration on the chemical composition and adhesion of vacuum-plasma coatings 12TH INTERNATIONAL CONFERENCE ON GAS DISCHARGE PLASMAS AND THEIR APPLICATIONS, 2015, 652