PRODUCTION OF AMORPHOUS METALLIC SURFACES BY MEANS OF A PULSED GLOW-DISCHARGE ELECTRON-BEAM

被引：12
|
作者：
MINGOLO, N
ROCCA, JJ
机构：
[1] NATL SCI FDN,CTR OPTOELECTR COMP SYST,FT COLLINS,CO 80523
[2] COLORADO STATE UNIV,DEPT ELECT ENGN,FT COLLINS,CO 80523
来源：
JOURNAL OF MATERIALS RESEARCH | 1992年 / 7卷 / 05期
基金：
美国国家科学基金会;
关键词：
D O I：
10.1557/JMR.1992.1096
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A pulsed glow discharge electron beam has been used for the production of metallic amorphous surfaces in MgZn alloys. Electron beam pulses of 20-mu-s pulse width produced by a 40 A, 22.5 kV glow discharge were found to provide sufficient energy for melting the metallic surfaces; that due to the rapid cooling to the substrate yielded amorphous phases. The system allows control of the energy density, penetration, and pulse width of the heating pulse.
引用
收藏
页码：1096 / 1099
页数：4
相关论文
共 50 条
  • [31] Pulsed electron-beam technology for surface modification of metallic materials
    Proskurovsky, DI
    Rotshtein, VP
    Ozur, GE
    Markov, AB
    Nazarov, DS
    Shulov, VA
    Ivanov, YF
    Buchheit, RG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (04): : 2480 - 2488
  • [32] ELECTRON-GUN WITH BEAM FORMATION IN A HIGH-VOLTAGE GLOW-DISCHARGE
    BALTAKOV, FN
    BOSAMYKIN, VS
    KORNILOV, VG
    KUDRYAVKIN, EV
    PAVLOVSKII, AI
    SELYAVSKII, VT
    SUKHANOV, LV
    CHELPANOV, VI
    ZHURNAL TEKHNICHESKOI FIZIKI, 1976, 46 (10): : 2195 - 2196
  • [33] THE PULSED GLOW-DISCHARGE AS AN ELEMENTAL ION-SOURCE
    KLINGLER, JA
    SAVICKAS, PJ
    HARRISON, WW
    JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY, 1990, 1 (02) : 138 - 143
  • [34] PREPARATION OF AMORPHOUS NICKEL FILM CATALYSTS BY GLOW-DISCHARGE
    IMANAKA, T
    TAMAKI, J
    TERANISHI, S
    CHEMISTRY LETTERS, 1984, (03) : 449 - 450
  • [35] THE GROWTH OF GLOW-DISCHARGE HYDROGENATED AMORPHOUS-SILICON
    BHAT, PK
    CHATHAM, H
    SHING, YH
    PERRY, JW
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1987, 97-8 : 1383 - 1386
  • [36] DC MAGNETRON GLOW-DISCHARGE AMORPHOUS-SILICON
    SMITH, GB
    MCKENZIE, DR
    SOLAR ENERGY MATERIALS, 1984, 11 (1-2): : 45 - 56
  • [37] ELECTROPHOTOGRAPHIC STUDIES OF GLOW-DISCHARGE AMORPHOUS-SILICON
    ODA, S
    SAITO, Y
    SHIMIZU, I
    INOUE, E
    PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1981, 43 (06): : 1079 - 1089
  • [38] LASER ANNEALING OF GLOW-DISCHARGE AMORPHOUS-SILICON
    SUSSMANN, RS
    HARRIS, AJ
    OGDEN, R
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) : 249 - 254
  • [39] AC CONDUCTION IN GLOW-DISCHARGE AMORPHOUS SILICON FILMS
    NITTA, S
    SHIMAKAWA, K
    SAKAGUCHI, K
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1977, 24 (01) : 137 - 140
  • [40] LUMINESCENCE DECAY IN GLOW-DISCHARGE DEPOSITED AMORPHOUS SILICON
    TSANG, C
    STREET, RA
    PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1978, 37 (05): : 601 - 608
12345