High-precision nanoscale length measurement

被引：7

作者：

Sheglov D.V. ^{[1
,2
]}

Kosolobov S.S. ^{[1
,2
]}

Fedina L.I. ^{[1
]}

Rodyakina E.E. ^{[1
]}

Gutakovskii A.K. ^{[1
]}

Sitnikov S.V. ^{[1
]}

Kozhukhov A.S. ^{[1
]}

Zagarskikh S.A. ^{[3
]}

Kopytov V.V. ^{[3
]}

Evgrafov V.I. ^{[3
]}

Shuvalov G.V. ^{[3
]}

Matveichuk V.F. ^{[3
]}

Latyshev A.V. ^{[1
,2
]}

机构：

[1] Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, pr. Lavrentieva 13, Novosibirsk

[2] Novosibirsk State University, Pirogova st. 2, Novosibirsk

[3] Siberian Research Institute of Metrology, pr. Dimitrova 4, Novosibirsk

来源：

Nanotechnologies in Russia | 2013年 / 8卷 / 7-8期

基金：

俄罗斯基础研究基金会;

关键词：

Atomic Force Microscope; Atomic Force Microscope Image; High Resolution Transmission Electron Microscopy; Silicon Surface; High Resolution Transmission Electron Microscopy Image;

D O I：

10.1134/S1995078013040162

中图分类号：

学科分类号：

摘要：

Modern lithographical methods used to create linear measures for nanometer-range dimensions and the main factors which limit the applications of such gages have been analyzed in the paper. Prospects for developing high-precision measures based on an atomically structured crystalline surface (containing monoatomic steps) whose parameters are bound to the crystallographic parameters of the crystal (traceable to the length measure) are shown. A method which can be used to create such measures based on controlling the surface morphology of monocrystalline silicon at an atomic level due to the effects of self-organization arising at the atomically clean surface as a result of annealing in ultrahigh vacuum is proposed. A description of the set of high-precision gages of vertical dimensions STEPP-IFP-1 in a size range of 0.31-31 nm with an error in the whole interval of gages of less than 0.05 nm is presented. The set of high-precision gages after carrying out state testing is included into the state registry of measuring means as measuring type no. 48115-11 (Federal Agency on Technical Regulating and Metrology order no. 6290 of October 31, 2011). © 2013 Pleiades Publishing, Ltd.

引用

页码：518 / 531

页数：13

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