Annealing effect on magnetoresistance in NiO-Co-Cu based spin valves

被引:0
|
作者
A.M. Zhang
X.S. Wu
L. Sun
Y.X. Wang
M. Lu
A. Hu
S.S. Jiang
Z.J. Chen
X. Chen
M.H. Sun
Z.H. Wu
机构
[1] Nanjing University,Lab of Solid State Microstructures, Department of Physics
[2] the Science Academic of China,BSRF, Institute of High Energy Physics
来源
Applied Physics A | 2005年 / 81卷
关键词
Thin Film; Operating Procedure; Electronic Material; Thermal Behavior; Coupling Effect;
D O I
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中图分类号
学科分类号
摘要
We have fabricated two sets of NiO-Co-Cu based spin valves by the magnetosputtering technique with different deposition parameters. Magnetoresistance (MR) measurements show that the MR value for the NiO layer under the bottom of Co/Cu/Co spin valve (BSV) is larger than that for the NiO layer at the top of Co/Cu/Co (TSV). The MR value of BSV decreases with increasing annealing temperature in air or in vacuum, which disappears at the blocking temperature of NiO, i.e., about 250 °C. There is maximum MR value for TSV annealing at a temperature range from room temperature to 350 °C. The different thermal behavior for BSV and TSV is explained by the competition between the interface roughness of NiO/Co, which was determined by the grazing incident X-ray reflectivity and X-ray diffuse scattering, and the coupling effect between Co layer and NiO layer.
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页码:501 / 505
页数:4
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