Lateral metrology using scanning probe microscopes, 2D pitch standards and image processing

被引：0
|
作者：
J.F. Jorgensen
C.P. Jensen
J. Garnaes
机构：
[1] Danish Institute of Fundamental Metrology,
[2] Anker Engelunds Vej 1,undefined
[3] Bldg. 307,undefined
[4] DK 2800 Lyngby,undefined
[5] Denmark (E-mail: jfj@dfm.dtu.dk,undefined
[6] cpj@dfm.dtu.dk,undefined
[7] jg@dfm.dtu.dk),undefined
来源：
Applied Physics A | 1998年 / 66卷
关键词：
PACS: 2.30.W; 06.20; 07.79;
D O I：
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中图分类号：
学科分类号：
摘要：
引用
收藏
页码：S847 / S852
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