Indium tin oxide (ITO) thin films doped with Au, Ni, or Pt (3.5 at.% to 10.5 at.%) were deposited on p-GaN epilayers (Mg ~4 × 1019 cm−3) using direct-current (DC) sputter codeposition. It was found that undoped ITO con- tacts to p-GaN exhibited leaky Schottky behavior, whereas the incorporation of a small amount of Au (3.5 at.% to 10.5 at.%) significantly improved their ohmic characteristics. Compared with standard Ni/ITO contacts, the Au-doped ITO contacts had a similar specific contact resistance in the low 10−2 Ω cm−2 range, but were more stable above 600°C and more transparent at blue wavelengths. These results provide support for the use of Au-doped ITO ohmic contact to p-type GaN in high-brightness blue light-emitting diodes.
机构:
Zhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R ChinaZhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
Lu, Y. F.
Ye, Z. Z.
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Zhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R ChinaZhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
Ye, Z. Z.
Zeng, Y. J.
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Zhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R ChinaZhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
Zeng, Y. J.
Zhu, L. P.
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Zhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R ChinaZhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
Zhu, L. P.
Zhao, B. H.
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Zhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R ChinaZhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
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Univ Tours, INSA Ctr Val de Loire, GREMAN UMR 7347, CNRS, F-37071 Tours, FranceUniv Tours, INSA Ctr Val de Loire, GREMAN UMR 7347, CNRS, F-37071 Tours, France
Mauduit, Clement
Tlemcani, Taoufik Slimani
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Univ Tours, INSA Ctr Val de Loire, GREMAN UMR 7347, CNRS, F-37071 Tours, FranceUniv Tours, INSA Ctr Val de Loire, GREMAN UMR 7347, CNRS, F-37071 Tours, France
Tlemcani, Taoufik Slimani
Zhang, Meiling
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Univ Tours, INSA Ctr Val de Loire, GREMAN UMR 7347, CNRS, F-37071 Tours, FranceUniv Tours, INSA Ctr Val de Loire, GREMAN UMR 7347, CNRS, F-37071 Tours, France
Zhang, Meiling
Yvon, Arnaud
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STMicroelectron Tours, F-37071 Tours, FranceUniv Tours, INSA Ctr Val de Loire, GREMAN UMR 7347, CNRS, F-37071 Tours, France
Yvon, Arnaud
Vivet, Nicolas
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STMicroelectron Tours, F-37071 Tours, FranceUniv Tours, INSA Ctr Val de Loire, GREMAN UMR 7347, CNRS, F-37071 Tours, France
Vivet, Nicolas
Charles, Matthew
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Univ Grenoble Alpes, CEA, LETI, F-38000 Grenoble, FranceUniv Tours, INSA Ctr Val de Loire, GREMAN UMR 7347, CNRS, F-37071 Tours, France
Charles, Matthew
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Gwoziecki, Romain
Alquier, Daniel
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Univ Tours, INSA Ctr Val de Loire, GREMAN UMR 7347, CNRS, F-37071 Tours, FranceUniv Tours, INSA Ctr Val de Loire, GREMAN UMR 7347, CNRS, F-37071 Tours, France