Correlation between surface oxide and photoluminescence properties of Si nanoparticles prepared by pulsed laser ablation

被引:0
|
作者
I. Umezu
K. Matsumoto
M. Inada
T. Makino
A. Sugimura
机构
[1] Konan University,Department of Physics
[2] Konan University,High Technology Research Center
来源
Applied Physics A | 2004年 / 79卷
关键词
Surface Treatment; Native Oxidation; Active Method; Photoluminescence Property; Important Technique;
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中图分类号
学科分类号
摘要
Hydrogenated silicon nanoparticles were prepared by pulsed laser ablation (PLA) of Si target in hydrogen gas. We observed native oxidation process for 250 days by infrared (IR) absorption measurement and investigated correlation between native oxidation and photoluminescence (PL) properties. We found three PL peak regions, around 800 nm, 600–700 nm and 400–500 nm. These PL peak wavelengths depended on the Si-O bond density and remarkable correlation with composition of the oxide layer was not observed. The native oxidation is a passive method to modify the surface. We propose plasma surface treatment as an active method. The PL wavelength varied by the surface treatments due to suppression of native oxidation. The surface modification is an important technique to control PL peak wavelength of silicon nanoparticles.
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页码:1545 / 1547
页数:2
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