Atmospheric pressure high-power impulse plasma source for deposition of metallic coatings

被引:0
|
作者
Vasiliki Z. Poenitzsch
Ronghua Wei
Michael A. Miller
Kent E. Coulter
机构
[1] Southwest Research Institute,Materials Engineering Department
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
A novel high-power impulse plasma source (HiPIPS) technology that combines atmospheric pressure plasma jets with high-power pulsed direct current generators is described. Pulsed power is applied in microsecond pulses (20 µs) at low duty cycle (10%) and low frequency (0.5 kHz) leading to high peak power densities (10–75 kW) and high peak currents (100–250 A) while maintaining low average power (<40 W) and low processing temperatures (<50 °C). These conditions result in the generation of a highly dense plasma discharge (ne = 6.23 × 1016 cm−3) for surface modification and deposition of coatings. Using HiPIPS, Ar-initiated metallic Ti, CoCr, or Ti–6Al–4V plasma was generated, and the plasma properties were characterized by measuring current–voltage characteristics, electron densities (Langmuir probe), and optical emission spectra. HiPIPS CoCr and Ti–6Al–4V coatings were deposited for proof of concept of the technique. The resulting coatings were examined with scanning electron microscopy, energy-dispersive X-ray spectroscopy, and nanoindentation.
引用
收藏
页码:2078 / 2085
页数:7
相关论文
共 50 条
  • [21] High-power laser plasma source of nuclear reaction
    Andreev, AA
    Charukchev, AV
    Yashin, VE
    LASER OPTICS 2000: ULTRAFAST OPTICS AND SUPERSTRONG LASER FIELDS, 2001, 4352 : 102 - 112
  • [22] Low-Temperature Atmospheric Pressure Plasma Processes for the Deposition of Nanocomposite Coatings
    Uricchio, Antonella
    Fanelli, Fiorenza
    PROCESSES, 2021, 9 (11)
  • [23] Deposition of Functional Coatings from an Acetylene-Containing Plasma at Atmospheric Pressure
    Plevako F.V.
    Gorbatov S.V.
    Davidovich P.A.
    Prikhod′ko E.M.
    Shushkov S.V.
    Krul′ L.P.
    Butovskaya G.V.
    Shakhno O.V.
    Gusakova S.V.
    Korolik O.V.
    Mazanik A.V.
    J. Eng. Phys. Thermophys., 2 (471-477): : 471 - 477
  • [24] Atmospheric pressure plasma deposition of antimicrobial coatings on non-woven textiles
    Nikiforov, Anton Yu.
    Deng, Xiaolong
    Onyshchenko, Iuliia
    Vujosevic, Danijela
    Vuksanovic, Vineta
    Cvelbar, Uros
    De Geyter, Nathalie
    Morent, Rino
    Leys, Christophe
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2016, 75 (02):
  • [25] Forevacuum-pressure plasma-cathode high-power continuous electron beam source
    Zenin, A. A.
    Bakeev, I. Yu.
    Klimov, A. S.
    Oks, E. M.
    Tran, Van Tu
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2020, 91 (03):
  • [26] An atmospheric pressure plasma source
    Park, J
    Henins, I
    Herrmann, HW
    Selwyn, GS
    Jeong, JY
    Hicks, RF
    Shim, D
    Chang, CS
    APPLIED PHYSICS LETTERS, 2000, 76 (03) : 288 - 290
  • [27] Deposition of AlN Thin Film by High-Power Impulse Magnetron Sputtering with Tilted Sputter Target at Different Working Pressure
    Bin Azman, Zulkifli
    Bin Nayan, Nafarizal
    Bakar, Ahmad Shuhaimi Bin Abu
    Bin Yusop, Zamri
    Bin Mamat, Mohamad Hafiz
    Tahan, Muliana Binti
    Sahari, Norain Binti
    Bin Ahmad, Mohd Yazid
    2020 18TH IEEE STUDENT CONFERENCE ON RESEARCH AND DEVELOPMENT (SCORED), 2020, : 352 - 356
  • [28] Impulse plasma deposition of alumina oxide thin coatings
    Zdunek, K
    SURFACE MODIFICATION TECHNOLOGIES XI, 1998, : 436 - 440
  • [29] Plasma generation at atmospheric pressure using a high-power microwave beam and its application to rocket propulsion
    Oda, Yasuhisa
    Komurasaka, Kimiya
    Takahashi, Koji
    Kasugai, Atsushi
    Imai, Tsuyoshi
    Sakamoto, Keishi
    ELECTRICAL ENGINEERING IN JAPAN, 2007, 161 (02) : 1 - 7
  • [30] High-Rate Reactive High-Power Impulse Magnetron Sputter Deposition: Principles and Applications
    Vlcek, J.
    Rezek, J.
    Belosludtsev, A.
    Kozak, T.
    SOCIETY OF VACUUM COATERS 59TH ANNUAL TECHNICAL CONFERENCE PROCEEDINGS, 2016, 2016, : 135 - +