Annealing temperature effect on the mechanical and tribological properties of molybdenum nitride thin films

被引:26
|
作者
Khojier K. [1 ]
Mehr M.R.K. [2 ]
Savaloni H. [3 ]
机构
[1] Department of Physics, Chalous Branch, Islamic Azad University, Chalous
[2] Department of Physics, Faculty of Science, Central Tehran Branch, Islamic Azad University, Tehran
[3] Department of Physics, University of Tehran, North Kargar Street, Tehran
关键词
Friction coefficient; Hardness; Molybdenum nitride; Nanostructure; Scratch volume;
D O I
10.1186/2193-8865-3-5
中图分类号
学科分类号
摘要
Mo thin films with 100-nm thickness were deposited on silicon substrates using DC magnetron sputtering method. Mo thin films were subsequently annealed at different temperatures (400°C to 900°C) with flow of nitrogen. The crystallographic structure of the samples was obtained using X-ray diffraction method. Atomic force microscopy and scanning electron microscopy were used for surface morphology investigation. Nano-indentation and scratch tests were performed to obtain the surface hardness and friction coefficient of the samples, respectively. Results show that the γ-Μο2Ν(111) phase of molybdenum nitride with face-centered cubic structure and higher hardness, elastic modulus, and lower coefficient of friction and scratch volume is formed when the sample is annealed at 650°C, while the Mo2N phase with tetragonal structure and lower hardness, elastic modulus, and higher scratch volume and friction coefficient is formed at higher temperatures of 775°C and 900°C. It is found that increasing the annealing temperature causes an increase of the grain size and film surface roughness. From the mechanical results, it may be deduced that 650°C is a critical temperature for variation of mechanical and tribological properties. © 2013, Khojier et al; licensee Springer.
引用
收藏
相关论文
共 50 条
  • [31] Effect of annealing on the properties of RF sputtered indium molybdenum oxide thin films
    Elangovan, E.
    Martins, R.
    Fortunato, E.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (19-25) : 2831 - 2838
  • [32] Effect of annealing temperature on the mechanical properties of flexible graphene films
    Song Ning-jing
    Lu Chun-xiang
    Chen Cheng-meng
    Ma Can-liang
    Kong Qing-qiang
    NEW CARBON MATERIALS, 2017, 32 (03) : 221 - 226
  • [33] Influence of Nitrogen gas flow on mechanical and tribological properties of sputtered chromium nitride thin films
    Jafarzadeh, Morteza
    Khojier, Kaykhosrow
    Savaloni, Hadi
    ULTRAFINE GRAINED AND NANO-STRUCTURED MATERIALS IV, 2014, 829 : 497 - +
  • [34] Tribological properties of sputtered tungsten and tungsten nitride thin films
    Wong
    K.M.
    ShenY.G.
    P.L.
    Science China Mathematics, 2001, (S1) : 242 - 247
  • [35] Effect of annealing temperature on mechanical properties of molybdenum alloy and its welded joints
    Zaderij, B.A.
    Kotenko, S.S.
    Marinchenko, A.E.
    Polishchuk, E.P.
    Yushchenko, K.A.
    Avtomaticheskaya Svarka, 2004, (06): : 23 - 28
  • [36] Tribological properties of sputtered tungsten and tungsten nitride thin films
    Wong
    K.M.
    ShenY.G.
    Wong
    P.L.
    ScienceinChina,SerA., 2001, Ser.A.2001(S1) (S1) : 242 - 247
  • [37] Tribological properties of sputtered tungsten and tungsten nitride thin films
    Wong, KM
    Shen, YG
    Wong, PL
    SCIENCE IN CHINA SERIES A-MATHEMATICS PHYSICS ASTRONOMY, 2001, 44 : 242 - 247
  • [38] Effect of thin films thickness and annealing temperature on structure properties of nano polysilicon thin films
    Zhao, Xiao-Feng
    Wen, Dian-Zhong
    Wang, Tian-Qi
    Ding, Yu-Jie
    Gongneng Cailiao/Journal of Functional Materials, 2010, 41 (10): : 1753 - 1756
  • [39] The effect of annealing on mechanical and tribological properties of diamond-like carbon multilayer films
    Zhang, W
    Tanaka, A
    Wazumi, K
    Koga, Y
    Xu, BS
    DIAMOND AND RELATED MATERIALS, 2004, 13 (11-12) : 2166 - 2169
  • [40] Effects of deposition temperature on the mechanical and physical properties of silicon nitride thin films
    Walmsley, BA
    Liu, Y
    Hu, XZ
    Bush, MB
    Winchester, KJ
    Martyniuk, M
    Dell, JM
    Faraone, L
    JOURNAL OF APPLIED PHYSICS, 2005, 98 (04)