Low-Frequency Glow Discharge Deposition of a Silicon Dioxide Film onto the Surface of Glass Microspheres

Laser fusion research demands microsized hollow shells with a large diameter and a thick wall. Because these geometric parameters are difficult to provide by fabrication, the wall thickness was increased by deposition of a silicon dioxide film on the outer surface of glass microspheres. The film was obtained by decomposition of tetraethoxysilane vapor in a low-frequency discharge plasma in mixtures with argon and oxygen. The thickness of coating was shown to be a linear function of the deposition time and the consumption of the precursor organoelement compound. The composition of plasma-deposited layers was studied and their density and refractive index were determined. Elemental analysis data showed that the coating comprised silicon dioxide with carbon and hydrogen impurities.