Sidewall slopes and roughness of SU-8 HARMST

被引:0
|
作者
K. D. Vora
B.-Y. Shew
B. Lochel
E. C. Harvey
J. P. Hayes
A. G. Peele
机构
[1] La Trobe University,Department of Physics
[2] National Synchrotron Radiation Research Center,Device Technology Group
[3] Application Center for Micro Engineering,Industrial Research Institute of Swinburne
[4] BESSY,undefined
[5] Swinburne University of Technology,undefined
来源
Microsystem Technologies | 2008年 / 14卷
关键词
PMMA; Crosslink Density; Exposure Dose; Sherwood Number; Dimensional Error;
D O I
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中图分类号
学科分类号
摘要
In recent years we have investigated the feasibility of deep X-ray lithography in SU-8 as a means of fabricating very high aspect ratio and densely packed arrays of square channels. We have demonstrated how to overcome the problems in adhesion and stiction accompanying the fabrication of such high aspect ratio structures. We have also examined how to calculate the development time of these structures and how this can be used to optimize the dimensional fidelity of the resulting structures. More recently we have considered the effect of the non-uniform dose deposition and beam hardening as a function of depth in the resist on factors such as the surface roughness and the sidewall taper. In this paper we describe our experimental program, review these results and discuss their implications for the operation of our target device—the lobster-eye telescope.
引用
收藏
页码:1701 / 1708
页数:7
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