Combined redox and plasmonic electrochromic effects in WO3/ITO double-layer films

被引:0
|
作者
Yang Ren
Xiaoge Zhou
Qiuhong Wang
Gaoyang Zhao
机构
[1] Xi’an University of Technology,Advanced Material Analysis and Test Center
[2] Xi’an University of Technology,School of Material Science and Engineering
关键词
Tungsten oxide; ITO; Vis-NIR; Plasmonic electrochromism;
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学科分类号
摘要
In this paper, a double-layer coating with both redox and plasmonic electrochromic properties has been designed and deposited on fluorine doped tin oxide (FTO) substrates by sol-gel method. This coating consists of an amorphous WO3 film and a nanocrystalline indium tin oxide (ITO) film. Both the valence of W atoms in WO3 and the localized surface plasmon resonance (LSPR) frequency of ITO nanocrystals can be tuned reversibly and persistently by electrochemical process. Due to the LSPR electrochromism, the double-layer films can block near-infrared (NIR) and visible (Vis) light selectively and independently by applying different voltages, which is better and more functional than the traditional electrochromic films. High transmittance of WO3/ITO films is obtained both in Vis and NIR for positive applied voltages. When a weakly negative voltage is applied, the transmittance of WO3/ITO films in visible region is still high, while the transmittance in NIR decreases. The transmittance of the double-layer films in both Vis and NIR further decreases for increasingly more negative voltages.
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页码:732 / 742
页数:10
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