Effects of boric acid on hydrogen evolution and internal stress in films deposited from a nickel sulfamate bath

被引:0
|
作者
Y. Tsuru
M. Nomura
F.R. Foulkes
机构
[1] Kyushu Institute of Technology,Department of Materials Science and Engineering
[2] University of Toronto,Department of Chemical Engineering and Applied Chemistry
来源
Journal of Applied Electrochemistry | 2002年 / 32卷
关键词
boric acid; hydrogen evolution; internal stress; nickel films; nickel sulfamate bath;
D O I
暂无
中图分类号
学科分类号
摘要
The effects of boric acid additions on the pH close to the electrode surface, on the hydrogen evolution reaction and on the internal stress in the plated films were studied for the high speed electroplating of nickel from a nickel sulfamate bath at a current density close to the nickel ion limiting current density. The study was carried out at 50 °C and pH 4.0 using a 1.55 M nickel sulfamate plating bath containing boric acid at concentrations ranging from 0 to 0.81 mol L−1. The variation of the internal strain in the plated nickel films was determined in situ using a resistance wire-type strain gauge fitted to the reverse side of the copper electrode substrate. The solution pH at a distance of 0.1 mm from the depositing nickel film was measured in situ using a miniature pH sensor assembly consisting of a thin wire-type antimony electrode and a Ag/AgCl/sat. KCl electrode housed in a thin Luggin capillary. The addition of boric acid was shown to effectively suppress the hydrogen evolution reaction at nickel electrodeposition rates (18.0 A dm−2) close to the limiting current density (~20 A dm−2). Consequently, the solution pH adjacent to the plating metal surface was maintained at a value close to that in the bulk solution and the development of high internal stresses in the deposited nickel films was avoided.
引用
收藏
页码:629 / 634
页数:5
相关论文
共 50 条
  • [11] PHYSICAL CHARACTERISTICS OF NICKEL ELECTRDEPOSITED FROM A NICKEL CHLORIDE/N, N-DIMETHYFORMAMIDE BATH IN PRESENCE OF BORIC-ACID
    SRIVASTAVA, HK
    TIKOO, PK
    TRANSACTIONS OF THE INDIAN INSTITUTE OF METALS, 1987, 40 (05): : 435 - 439
  • [12] Effect of cobalt on hardness and internal stress in heavy deposits from a nickel sulphamate bath
    Kranz, E.
    Galvanotechnik, 1998, 89 (05): : 1506 - 1513
  • [13] HYDROGEN EVOLUTION FROM PLASMA-DEPOSITED AMORPHOUS SILICON FILMS
    MATYSIK, KJ
    MOGAB, CJ
    BAGLEY, BG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 302 - 304
  • [14] HYDROGEN EVOLUTION FROM PLASMA-DEPOSITED AMORPHOUS-SILICON FILMS
    BEYER, W
    WAGNER, H
    JOURNAL DE PHYSIQUE, 1981, 42 (NC4): : 783 - 786
  • [15] Effects of additives on morphology and hydrogen evolution activities of nickel films prepared by electrodepositing
    Wu, Xiongxi
    Gao, Qifeng
    Li, Zesong
    INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE, 2015, 10 (11): : 8823 - 8833
  • [16] Design of Nickel Electrodes by Electrodeposition: Effect of Internal Stress on Hydrogen Evolution Reaction in Alkaline Solutions
    Kim, Sung-Min
    Jin, Sang-Hoon
    Lee, Yu-Jin
    Lee, Min Hyung
    ELECTROCHIMICA ACTA, 2017, 252 : 67 - 75
  • [17] Study on the internal stress in nickel films deposited onto silicon substrates by ion beam and vapor deposition (IVD)
    Nissin Electric Co Ltd, Kyoto, Japan
    Thin Solid Films, 1-2 (352-355):
  • [18] Study on the internal stress in nickel films deposited onto silicon substrates by ion beam and vapor deposition (IVD)
    Kuratani, N
    Murakami, Y
    Imai, O
    Ebe, A
    Nishiyama, S
    Ogata, K
    THIN SOLID FILMS, 1996, 281 : 352 - 355
  • [19] Stress development in plasma-deposited silicon dioxide thin-films due to hydrogen evolution
    Mani, Sathya
    Saif, Taher
    THIN SOLID FILMS, 2007, 515 (05) : 3120 - 3125
  • [20] Catalytic effects of molybdate and chromate-molybdate films deposited on platinum for efficient hydrogen evolution
    Diaz-Morales, Oscar
    Lindberg, Aleksandra
    Smulders, Vera
    Anil, Athira
    Simic, Nina
    Wildlock, Mats
    Alvarez, German Salazar
    Mul, Guido
    Mei, Bastian
    Cornell, Ann
    JOURNAL OF CHEMICAL TECHNOLOGY AND BIOTECHNOLOGY, 2023, 98 (05) : 1269 - 1278