Diagnostics of plasma processes in micro- and nanoelectronics

被引：0

作者：

K. V. Rudenko

机构：

[1] Russian Academy of Sciences,Institute of Physics and Technology

来源：

High Energy Chemistry | 2009年 / 43卷

关键词：

Plasma Reactor; High Energy Chemistry; Plasma Diagnostics; Magnetic Wall; Plasma Etching Process;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

The role of plasma diagnostics in the progress of plasma technologies in micro- and nanoelectronics is elucidated. The use of various diagnostic techniques in resolving the problems of design optimization of plasma reactors, development of new industrial processes, and their monitoring is considered. It is shown that in situ plasma diagnostics makes it possible to determine not only the end of the processes but also the rate of plasma etching of microelectronic structures and process selectivity.

引用

页码：196 / 203

页数：7

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