The effect of electromagnetic fields on the process of formation of ultrathin Fe-Ni films during their deposition under a plasma-stimulated deposition

被引：1
|
作者：
Bochkarev V.F. [1 ]
Buchin E.Yu. [1 ]
机构：
[1] Yaroslavl' Branch, Physicotechnical Institute, Russian Academy of Sciences, Yaroslavl' 150 007
来源：
Russian Microelectronics | 2009年 / 38卷 / 03期
关键词：
5;
D O I：
10.1134/S1063739709030032
中图分类号：
学科分类号：
摘要：
The effect of electromagnetic fields and a current flowing across the films during the growth process on their crystalline structure and electrical, magnetic, and galvanomagnetic properties is investigated. Under the optimal parameters of the deposition process, polycrystalline, magnetic, and conducting films of permalloy at least 1.7 nm thick are obtained. Two critical thicknesses of the films are established, at which the scattering mechanisms of the conduction electrons vary. © 2009 Pleiades Publishing, Ltd.
引用
收藏
页码：165 / 170
页数：5
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