Removal of Th4+ ions from aqueous solutions by graphene oxide

被引:0
|
作者
Ning Pan
Debin Guan
Ting He
Ruibing Wang
Ian Wyman
Yongdong Jin
Chuanqin Xia
机构
[1] Sichuan University,College of Chemistry
[2] Chinese Academy of Engineering Physics,New Materials R&D Center, Institute of Chemical Materials
[3] Nordion Inc.,Department of Chemistry
[4] Queen’s University,Key Laboratory of Radiation Physics and Technology, Ministry of Education, Institute of Nuclear Science and Technology
[5] Sichuan University,undefined
来源
Journal of Radioanalytical and Nuclear Chemistry | 2013年 / 298卷
关键词
Graphene oxide; Th; Adsorption; Isotherm; Desorption;
D O I
暂无
中图分类号
学科分类号
摘要
The removal of Th4+ ions from aqueous solutions was investigated using single-layer graphene oxide (GO) as a sorbent which was prepared by the modified Hummers’ method through batch adsorption experiments at room temperature. Structural characterizations of the sorbent were also investigated. The influences of the pH value of solution, contact time, sorbent dose, ionic strength, the initial metal ion concentration and temperature on the adsorption of Th4+ were also investigated. These results indicated that the adsorption of Th4+ was dependent on the pH and independent on the ionic strength. The sorbent provided significant Th4+ removal (>98.7 %) at pH 3.0 and the adsorption equilibrium was achieved after only 10 min. The Langmuir adsorption isotherm fit the absorption profile very closely, and indicated that a maximum adsorption capacity of 1.77 mmol g−1 of GO (411 mg g−1) after 2 h. The thermodynamic parameters showed that this adsorption process was endothermic and spontaneous. Moreover, the desorption level of Th4+ from GO, by using 0.1 mol L−1 H2SO4 as a stripping agent, was 84.2 ± 1.2 %, and that of 0.5 mol L−1 HNO3 as a stripping agent, was 79.8 ± 3.0 %.
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页码:1999 / 2008
页数:9
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