Performance evaluation of hetero-stacked TFET for variation in lateral straggle and its application as digital inverter

被引:0
|
作者
K. Vanlalawmpuia
Rajesh Saha
Brinda Bhowmick
机构
[1] National Institute of Technology Silchar,Department of Electronics and Communication Engineering
[2] Vellore Institute of Technology Andhra Pradesh,Electronics and Communication Engineering Department
来源
Applied Physics A | 2018年 / 124卷
关键词
D O I
暂无
中图分类号
学科分类号
摘要
This paper reports the effect of variation in lateral straggle parameter on electrical parameters in hetero-stacked TFET (HS-TFET) through technology computer aided design simulator. Extension of the source/drain dopant into the channel region affects the performance of the device significantly. To optimize the performance of the HS-TFET, various parameters such as drain current (ID), subthreshold swing (SS), transconductance (gm), output conductance (gd), capacitances (Cgg, Cgs, and Cgd) and the cut-off frequency (fT) for variation in lateral straggle parameter from 0 to 8 nm is investigated. Higher value of lateral straggle results in increased in the lateral electric field which increases the ON current of the device, but the subthreshold swing deteriorates due to decrease in the effective channel length. The circuit performance of the HS-TFET is investigated using a digital inverter for variation in lateral straggle parameter.
引用
收藏
相关论文
共 20 条
  • [1] Performance evaluation of hetero-stacked TFET for variation in lateral straggle and its application as digital inverter
    Vanlalawmpuia, K.
    Saha, Rajesh
    Bhowmick, Brinda
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2018, 124 (10):
  • [2] Linearity Performance Analysis Due to Lateral Straggle Variation in Hetero-Stacked TFET
    K. Vanlalawmpuia
    Brinda Bhowmick
    Silicon, 2020, 12 : 955 - 961
  • [3] Linearity Performance Analysis Due to Lateral Straggle Variation in Hetero-Stacked TFET
    Vanlalawmpuia, K.
    Bhowmick, Brinda
    SILICON, 2020, 12 (04) : 955 - 961
  • [4] Deep insight into DC, RF/analog, and digital inverter performance due to variation in straggle parameter for gate modulated TFET
    Saha, Rajesh
    Vanlalawmpuia, K.
    Bhowmick, Brinda
    Baishya, Srimanta
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2019, 91 : 102 - 107
  • [5] A hetero-dielectric stack gate SOI-TFET with back gate and its application as a digital inverter
    Mitra, Suman Kr.
    Goswami, Rupam
    Bhowmick, Brinda
    SUPERLATTICES AND MICROSTRUCTURES, 2016, 92 : 37 - 51
  • [6] Optical Performance of Split-Source Z-Shaped Horizontal-Pocket and Hetero-Stacked TFET-Based Photosensors
    Shreyas Tiwari
    Rajesh Saha
    Journal of Electronic Materials, 2023, 52 : 1888 - 1899
  • [7] Optical Performance of Split-Source Z-Shaped Horizontal-Pocket and Hetero-Stacked TFET-Based Photosensors
    Tiwari, Shreyas
    Saha, Rajesh
    JOURNAL OF ELECTRONIC MATERIALS, 2023, 52 (03) : 1888 - 1899
  • [8] Optimisation of pocket doped junctionless TFET and its application in digital inverter
    Devi, Wangkheirakpam Vandana
    Bhowmick, Brinda
    MICRO & NANO LETTERS, 2019, 14 (01) : 69 - 73
  • [9] Effect of scaling on noise in Circular Gate TFET and its application as a digital inverter
    Goswami, Rupam
    Bhowmick, Brinda
    Baishya, Srimanta
    MICROELECTRONICS JOURNAL, 2016, 53 : 16 - 24
  • [10] Design, simulation and analog/RF performance evaluation of a hetero-stacked source dual metal T-shaped gate tunnel-FET in thermally variable environments
    Kumar, Mukesh
    Bhaskar, Gautam
    Chotalia, Aditya
    Rani, Chhavi
    Ghosh, Puja
    Nandi, Soumak
    Dubey, Shashank Kumar
    Koley, Kalyan
    Islam, Aminul
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2025, 31 (04): : 859 - 875