High-Intensity Titanium Ion Implantation into Aluminum under Conditions of Repetitively-Pulsed Energy Impact of a Beam on the Surface

被引:0
|
作者
Zaytsev, D. D. [1 ]
Ivanova, A. I. [1 ]
Gurulev, A. V. [1 ]
机构
[1] Natl Res Tomsk Polytech Univ, Tomsk, Russia
基金
俄罗斯科学基金会;
关键词
vacuum arc; implantation; energy impact; dynamics of temperature fields; radiation-stimulated diffusion;
D O I
10.1007/s11182-024-03157-6
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The article presents the results of numerical modeling and experimental studies of the dynamics of temperature fields on the aluminum sample surface after a short repetitively-pulsed energy impact on the surface, and at the synergy of high-intensity titanium ion implantation into aluminum with a simultaneous repetitively-pulsed energy impact of the beam on the surface. The data on the accumulation and spatial distribution of implanted titanium in aluminum are presented. Using the samples heated by a repetitively-pulsed ion beam to the temperatures of 300 degrees C and 500 degrees C with an additional heating during each pulse to a temperature approaching that of melting, a possibility of ion doping of aluminum with titanium to the depths of up to 5 and 8 mu m, respectively, is shown.
引用
收藏
页码:558 / 564
页数:7
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