Microbial Degradation of Radioactively Contaminated Polymer Films

被引:0
|
作者
G. S. Markov
I. V. Smirnov
V. N. Romanovskii
V. E. Tret'yakov
N. N. Khramov
N. D. Nugaeva
E. V. Lebedeva
机构
[1] Khlopin Radium Institute,Research and Production Association
[2] Komarov Botanic Institute,Russian Academy of Sciences
关键词
Polymer; Physical Chemistry; Inorganic Chemistry; Microbial Degradation; Aspergillus;
D O I
10.1023/A:1014895706019
中图分类号
学科分类号
摘要
Microbial degradation of polymeric paint and varnish coatings is considered from the standpoint of its application to deactivation of radioactively contaminated painted surfaces. Biodegradation of polymer films based on linseed stand oil, with mycelial microfungi Aspergillus, Penicillium, Trichoderma, Cladosporium, and Alternaria is studied. Some strains demonstrated a sufficiently high radioresistivity. After application of small amounts of digestible nutrient to the film surface the selected strains of microfungi can be used as destructors. Thus degraded areas of the films can be easily removed then by treatment with hot water.
引用
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页码:96 / 99
页数:3
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