Controlling the on/off current ratio of ferroelectric field-effect transistors

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作者
Ilias Katsouras
Dong Zhao
Mark-Jan Spijkman
Mengyuan Li
Paul W. M. Blom
Dago M. de Leeuw
Kamal Asadi
机构
[1] Max-Planck Institute for Polymer Research,
[2] Holst Centre,undefined
[3] High Tech Campus 31,undefined
[4] ASML,undefined
[5] De Run 6501,undefined
[6] China Photovoltaic Industry Association,undefined
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The on/off current ratio in organic ferroelectric field-effect transistors (FeFETs) is largely determined by the position of the threshold voltage, the value of which can show large device-to-device variations. Here we show that by employing a dual-gate layout for the FeFET, we can gain full control over the on/off ratio. In the resulting dual-gate FeFET the ferroelectric gate provides the memory functionality and the second, non-ferroelectric, control gate is advantageously used to set the threshold voltage. The on/off ratio can thus be maximized at the readout bias. The operation is explained by the quantitative analysis of charge transport in a dual-gate FeFET.
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