Control of carrier density by self-assembled monolayers in organic field-effect transistors

被引:0
|
作者
S. Kobayashi
T. Nishikawa
T. Takenobu
S. Mori
T. Shimoda
T. Mitani
H. Shimotani
N. Yoshimoto
S. Ogawa
Y. Iwasa
机构
[1] Institute for Materials Research,Department of Materials Science and Engineering
[2] Tohoku University,Department of Chemical Engineering
[3] CREST,undefined
[4] Japan Science and Technology Corporation,undefined
[5] Technology Platform Research Center,undefined
[6] SEIKO EPSON Corporation,undefined
[7] Fujimi,undefined
[8] Japan Advanced Institute of Science and Technology,undefined
[9] Tatsunokuchi,undefined
[10] Iwate University,undefined
[11] Ueda,undefined
[12] Iwate University,undefined
[13] Ueda,undefined
来源
Nature Materials | 2004年 / 3卷
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摘要
Organic thin-film transistors are attracting a great deal of attention due to the relatively high field-effect mobility in several organic materials. In these organic semiconductors, however, researchers have not established a reliable method of doping at a very low density level, although this has been crucial for the technological development of inorganic semiconductors. In the field-effect device structures, the conduction channel exists at the interface between organic thin films and SiO2 gate insulators. Here, we discuss a new technique that enables us to control the charge density in the channel by using organosilane self-assembled monolayers (SAMs) on SiO2 gate insulators. SAMs with fluorine and amino groups have been shown to accumulate holes and electrons, respectively, in the transistor channel: these properties are understood in terms of the effects of electric dipoles of the SAMs molecules, and weak charge transfer between organic films and SAMs.
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页码:317 / 322
页数:5
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