Analysis of the degradation of AlGaN/GaN HEMTs by high-temperature operation tests

被引:0
|
作者
Jong-Min Lee
Byoung-Gue Min
Cheol-Won Ju
Ho-Kyun Ahn
Jae-Kyoung Mun
Jong-Won Lim
Eunsoo Nam
机构
[1] Electronics and Telecommunications Research Institute,RF Convergence Components Research Section, IT Materials and Components Laboratory
来源
Journal of the Korean Physical Society | 2014年 / 64卷
关键词
Schottky contact; AlGaN/GaN; HEMT; Reliability; Operation test; Channel temperature; 85.30.De; 85.30.Tv; 84.37.+q; 72.80.Ey;
D O I
暂无
中图分类号
学科分类号
摘要
In this paper, we study the degradation phenomenon and its effect on the lifetime of AlGaN/GaN HEMTs by means of high-temperature operation tests. To estimate the self-heating effect, we performed electrical measurements at several temperatures. Packaged devices were tested at various bias levels and a plate temperature of 150 °C. The lifetime of devices strongly depended on the junction temperature. By means of electrical characterization, the device degradation was demonstrated and evaluated. After the operation test, the drain current and the transconductance were found to be decreased and the threshold voltage was shifted in a positive direction. The leakage current was remarkably decreased. On the basis of the experimental results, the degradation is ascribed to the hot electron effect and to Schottky contact degradation.
引用
收藏
页码:1446 / 1450
页数:4
相关论文
共 50 条
  • [41] Reliability of GaN HEMTs: Current Degradation in GaN/AlGaN/AlN/GaN HEMT
    Padmanabhan, Balaji
    Vasileska, Dragica
    Goodnick, Stephen M.
    2012 15TH INTERNATIONAL WORKSHOP ON COMPUTATIONAL ELECTRONICS (IWCE), 2012,
  • [42] AlGaN/GaN/InGaN/GaN DH-HEMTs with GaN channel layer grown at high temperature
    Zhang, Lu
    Wang, Xiaoliang
    Xiao, Hongling
    Chen, Hong
    Feng, Chun
    Shen, Guangdi
    Wang, Zhanguo
    Hou, Xun
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2013, 62 (02): : 10202-p1 - 10202-p6
  • [43] AlGaN/GaN HEMTs -: Operation in the K-band and above
    Smorchkova, IP
    Wojtowicz, M
    Sandhu, R
    Tsai, R
    Barsky, M
    Namba, C
    Liu, PS
    Dia, R
    Truong, M
    Ko, D
    Wang, J
    Wang, H
    Khan, A
    IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 2003, 51 (02) : 665 - 668
  • [44] High-temperature performance of AlGaN/GaN HFETs and MOSHFETs
    Donoval, D.
    Florovic, M.
    Gregusova, D.
    Kovac, J.
    Kordos, P.
    MICROELECTRONICS RELIABILITY, 2008, 48 (10) : 1669 - 1672
  • [45] High-temperature characteristics of strain in AlGaN/GaN heterostructures
    Chen, DQ
    Shen, B
    Zhang, KX
    Tao, YQ
    Wu, XS
    Xu, J
    Zhang, R
    Zheng, YD
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (1A): : 18 - 20
  • [46] High performance and high reliability AlGaN/GaN HEMTs
    Kikkawa, Toshihide
    Makiyama, Kozo
    Ohki, Toshihiro
    Kanamura, Masahito
    Imanishi, Kenji
    Hara, Naoki
    Joshin, Kazukiyo
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2009, 206 (06): : 1135 - 1144
  • [47] RF High-Power Operation of AlGaN/GaN HEMTs Epitaxially Grown on Diamond
    Hirama, Kazuyuki
    Kasu, Makoto
    Taniyasu, Yoshitaka
    IEEE ELECTRON DEVICE LETTERS, 2012, 33 (04) : 513 - 515
  • [48] Temperature-dependent nonlinearities in GaN/AlGaN HEMTs
    Islam, SS
    Anwar, AFM
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2002, 49 (05) : 710 - 717
  • [49] Ir/Al multilayer Gates for High Temperature Operated AlGaN/GaN HEMTs
    Lalinsky, Tibor
    Vanko, Gabriel
    Dobrocka, Edmund
    Osvald, Jozef
    Babchenko, Oleg
    Dzuba, Jaroslav
    Vesely, Marian
    Vanco, L'ubomir
    Vogrincic, Peter
    Vincze, Andrej
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2017, 214 (12):
  • [50] Effect of Oxygen Annealing Temperature on AlGaN/GaN HEMTs
    Seok, Ogyun
    Kim, Young-Shil
    Lim, Jiyong
    Han, Min-Koo
    2011 IEEE 23RD INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND ICS (ISPSD), 2011, : 235 - 238