Evolution of wavefront metrology enabling development of high-resolution optical systems

被引：0
|
作者：
Yutaka Ichihara
机构：
[1] Nikon Corporation,Core Technology Head Quarters
来源：
Optical Review | 2014年 / 21卷
关键词：
lithography; projection optics; resolution; interferometer; wavefront; aberration; aspheric surface distortion; point diffraction interferometer;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The development of high-resolution projection optics for semiconductor lithography is briefly described and is enabled by precise wavefront measurement. Then, the evolution of the interferometer for the measurement of the wavefront aberration of these optics is described together with the development of the interferometer for the measurement of the surface errors of the element lenses. The measurement of subnanometer accuracy is achieved in mass production.
引用
收藏
页码：833 / 838
页数：5
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