Sputtering of Silicon Surface during Low-Energy High-Dose Implantation with Silver Ions

被引：0
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作者：
V. V. Vorob’ev
A. M. Rogov
V. I. Nuzhdin
V. F. Valeev
A. L. Stepanov
机构：
[1] Interdisciplinary Center Analytic Microscopy,
[2] Kazan Federal University,undefined
[3] Kazan Zavoisky Physical Technical Institute,undefined
[4] Federal Scientific Center KazNTs,undefined
[5] Russian Academy of Sciences,undefined
来源：
Technical Physics | 2020年 / 65卷
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页码：1156 / 1162
页数：6
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