Study of Si and C adatoms and SiC clusters on the silicon surface by the molecular dynamics method

被引:0
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作者
V. S. Kharlamov
Yu. V. Trushin
E. E. Zhurkin
M. N. Lubov
J. Pezoldt
机构
[1] Russian Academy of Sciences,Ioffe Physico
[2] Russian Academy of Sciences,Technical Institute
[3] St. Petersburg State Technical University,St. Petersburg Research and Education Center of Science and Technology
[4] Ilmenau Technical University,Center for Micro
来源
Technical Physics | 2008年 / 53卷
关键词
68.43.-h; 68.55.Ac; 02.70.Ns; 68.35.Gy;
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摘要
Individual Si and C adatoms, as well as SiC clusters, on a Si surface are simulated by the molecular dynamics method in the course of investigation of the initial stages of formation of a SiC layer on silicon with the help of molecular beam epitaxy. The potential energy surfaces for Si and C adatoms on the (2 × 1) reconstructed Si(001) surface and on the nonreconstructed Si(111) surface, as well as on the Si(111) surface with a SiC cluster, are calculated and analyzed. The values of migration barriers for adatoms on these surfaces are calculated. The effect of the SiC cluster on deformation of the surface region of Si(111) and on the migration of adatoms is investigated. The deep minima observed on the potential energy surfaces immediately above a cluster and at its boundaries can trap diffusing adatoms. The distributions of stresses and strains in the silicon lattice under a cluster on the surface are studied and described.
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