Effect of Methanesulfonic Acid on Chromium Electrodeposition

被引:0
|
作者
E. A. Efimov
L. D. Tok
机构
[1] Moscow State Evening Metallurgical Institute,
来源
Protection of Metals | 2000年 / 36卷
关键词
Hydrogen; Chromium; Inorganic Chemistry; Polarization Curve; Current Efficiency;
D O I
暂无
中图分类号
学科分类号
摘要
Partial polarization curves were plotted and the current efficiency of chromium was measured to show that addition of methanesulfonic acid to a chromium-plating electrolyte accelerates the deposition of chromium and increases its current efficiency because of a higher hydrogen overpotential.
引用
收藏
页码:609 / 610
页数:1
相关论文
共 50 条
  • [21] EFFECT OF MOLYBDATE IONS ON ELECTRODEPOSITION OF CHROMIUM
    SHLUGER, MA
    POZDEEVA, YV
    TOK, LD
    PROTECTION OF METALS, 1980, 16 (03): : 278 - 280
  • [22] THE EFFECT OF FORMIC-ACID ON ELECTRODEPOSITION OF CHROMIUM - THE DEPOSITION RATE AND PROPERTIES OF THE DEPOSIT
    VASHCHENKO, SV
    SOLOVEVA, ZA
    RUSSIAN JOURNAL OF ELECTROCHEMISTRY, 1994, 30 (02) : 220 - 223
  • [23] THE EFFECT OF CHROMIUM PARTICLES ON NICKEL ELECTRODEPOSITION
    WATSON, SW
    WALTERS, RP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (12) : 3633 - 3637
  • [24] Effect of electrode material on chromium electrodeposition
    Efimov, EA
    Chernykh, VV
    PROTECTION OF METALS, 1998, 34 (04): : 396 - 397
  • [25] EFFECT OF TEMPERATURE ON CHROMIUM ELECTRODEPOSITION PROCESS
    VOEVIDKA, SD
    UKRAINSKII KHIMICHESKII ZHURNAL, 1976, 42 (01): : 14 - 17
  • [26] Effect of carbide particles on chromium electrodeposition and protective properties of chromium
    Surviliene, S
    Cesuniene, A
    Juskenas, R
    TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 2004, 82 : 185 - 189
  • [27] Effects of Thiourea and Allyl Thioura on the Electrodeposition and Microstructures of Copper from Methanesulfonic Acid Baths
    Chiang, Chi-Haw
    Lin, Chun-Cheng
    Hu, Chi-Chang
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2021, 168 (03)
  • [28] Competitive Adsorption Between Suppressor and Accelerator in Copper Methanesulfonic Acid Bath tor Electrodeposition
    Wang, Dongfan
    Miao, Xiaoying
    Ling, Huiqin
    Li, Ming
    Dai, Fengwei
    Zhang, Wenqi
    Cao, Liqiang
    2017 18TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY (ICEPT), 2017, : 76 - 79
  • [29] EFFECT OF ADDITIVES ON ELECTRODEPOSITION OF COMPOSITE CHROMIUM COATINGS
    BERKH, O
    ESKIN, S
    ZAHAVI, J
    PLATING AND SURFACE FINISHING, 1994, 81 (03): : 62 - 64
  • [30] Effect of an alkylsulfo compound on the chromium electrodeposition rate
    Solodkova, LN
    Vashchenko, SV
    Solov'eva, ZA
    RUSSIAN JOURNAL OF ELECTROCHEMISTRY, 2001, 37 (07) : 718 - 722