Comparative Study of Optical and Electrical Properties of Grown-In and Freshly Introduced Dislocations in GaN by SEM Methods

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作者
P. S. Vergeles
E. B. Yakimov
V. I. Orlov
机构
[1] Institute of Microelectronics Technology and High Purity Materials RAS,
[2] Institute of Solid State Physics RAS,undefined
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关键词
GaN; Indentation; dislocation; cathodoluminescence; point defects;
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摘要
Electrical and optical properties of grown-in and freshly introduced dislocations in GaN have been studied by the electron beam induced current and cathodoluminescence methods. It is observed that the recombination properties of grown-in and freshly introduced basal plane and threading dislocations are comparable. That allows to assume the intrinsic nature of dislocation recombination activity in GaN. It is demonstrated that the recombination properties of basal plane dislocations weakly depend on their type. The behavior of dislocation-related luminescence at 3.1 eV is more complex. It can be observed not in all GaN crystals even when dislocations are introduced in the similar conditions. Besides, it is not observed on basal plane and threading grown-in dislocations. This luminescence is not produced by freshly introduced basal plane dislocations. These observations can be explained assuming that the dislocation-related luminescence is associated with point defects generated by dislocations gliding in pyramidal or prismatic slip planes.
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页码:5173 / 5177
页数:4
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