Effect of charged dislocation walls on mobility in GaN epitaxial layers

被引:0
|
作者
S. E. Krasavin
机构
[1] Joint Institute for Nuclear Research,
来源
Semiconductors | 2012年 / 46卷
关键词
Dislocation Density; Doping Level; Free Carrier; Dislocation Structure; Misfit Dislocation;
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中图分类号
学科分类号
摘要
A theoretical model in the context of a conventional representation on traditional notion concerning Read cylinders for interpretation of mobility collapse as a function of the concentration of free carriers in GaN-based films is suggested. Along with phonon and impurity scattering mechanisms, electron scattering due to charged dislocations embedded into the walls is taken into account in the model. An expression is obtained for the height of the drift barrier depending on the concentration of free carriers. Based on the derived equations, the dependence of the location of the mobility minimum on the dislocation structure is interpreted.
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页码:598 / 601
页数:3
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