Low-temperature nitriding of titanium in low-energy electron beam excited plasma

The effect of an electron beam and the related plasma on the structure, phase state, and microhardness of the surface of titanium has been studied in a broad range of beam currents (0.1–2.5 A), electron energies (0.1–1 keV), and gas pressures (0.01–1 Pa). This range was ensured by the grid stabilization of emissive properties of the plasma electron source, which formed a wide (∼40 cm2) electron beam in a space charge layer between the beam-excited plasma and the grid bounding the plasma cathode. The sample temperature (350–900°C) was determined by the electron beam parameters. The plasma density was additionally controlled by changing the gas (N2 or Ar-N2 mixture) pressure. It is established that, during the low-temperature nitriding process in low-energy electron beam plasma, the ion sputtering significantly affects the microhardness of a processed surface and the rate of growth of the hardened layer thickness. The possibility of nitriding at a low (−50 V) or floating potential of the sample eliminates the development of a surface relief and allows the process to be carried out in deep and narrow slits.