Tailoring the wetting response of silicon surfaces via fs laser structuring

被引:0
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作者
V. Zorba
E. Stratakis
M. Barberoglou
E. Spanakis
P. Tzanetakis
C. Fotakis
机构
[1] Institute of Electronic Structure and Laser,Physics Department
[2] Foundation for Research & Technology—Hellas (IESL-FORTH),Materials Science and Technology Department
[3] University of Crete,undefined
[4] University of Crete,undefined
[5] Technological Educational Institute of Crete,undefined
来源
Applied Physics A | 2008年 / 93卷
关键词
79.20.Ds; 68.08.Bc; 68.35.Ct; 68.35.Np; 47.55.Np;
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摘要
Control over the wettability of solids and manufacturing of functional surfaces with special hydrophobic and self-cleaning properties has aroused great interest because of its significance for a vast range of applications in daily life, industry and agriculture. We report here a simple method for preparing stable superhydrophobic surfaces by irradiating silicon (Si) wafers with femtosecond (fs) laser pulses and subsequently coating them with chloroalkylsilane monolayers. It is possible, by varying the laser pulse fluence on the surface, to achieve control of the wetting properties through a systematic and reproducible variation of roughness at micro- and nano-scale which mimics both the topology of the “model” superhydrophobic surface—the natural lotus leaf—, as well as its wetting response. Water droplets can move along these irradiated superhydrophobic surfaces, under the action of small gravitational forces, and experience subsequent immobilization, induced by surface tension gradients. These results demonstrate the potential of manipulating liquid motion through selective laser patterning.
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