共 42 条
Hydrophobic to superhydrophobic and hydrophilic transitions of Ar plasma-nanostructured PTFE surfaces
被引:11
|作者:
Pachchigar, Vivek
[1
,2
]
Gaur, Umesh K.
[1
]
Amrutha, T., V
[3
]
Sooraj, K. P.
[1
]
Hans, Sukriti
[2
]
Srivastava, Sanjeev K.
[4
]
Ranjan, Mukesh
[1
,2
]
机构:
[1] Inst Plasma Res, Plasma Surface Engn Div, Gandhinagar, Gujarat, India
[2] Homi Bhabha Natl Inst, Mumbai, Maharashtra, India
[3] Kadi Sarva Vishvavidyalaya, Dept Phys, Gandhinagar, Gujarat, India
[4] Indian Inst Technol Kharagpur, Dept Phys, Kharagpur, W Bengal, India
关键词:
Ar plasma;
plasma etching;
PTFE;
RF discharge;
superhydrophobic surfaces;
CROSS-LINKING;
POLYTETRAFLUOROETHYLENE PTFE;
POLYMERS;
ADHESION;
ARGON;
FILMS;
AIR;
PROTRUSIONS;
PERFORMANCE;
SPECTRA;
D O I:
10.1002/ppap.202200037
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Production of superhydrophobic polytetrafluoroethylene (PTFE) by Ar plasma etching is challenging as it leads to defluorination, resulting in a hydrophilic surface. The effect of radiofrequency power, treatment time, impurity, and surface temperature on Ar plasma-treated PTFE was investigated for producing a large-area superhydrophobic PTFE surface. To avoid impurity and substrate temperature effects, a single electrode-based arrangement with a sacrificial PTFE disc behind the specimen was used for plasma discharge. After 5 min treatment at 100 W, the surface became superhydrophobic (water contact angle = 156 degrees) due to the formation of isotropic nanostructures. However, 30 min of plasma treatment caused severe chemical changes resulting in a hydrophilic surface (water contact angle = 14 degrees). A yellowish layer was formed on the surface due to crosslinking, redeposition of fluorocarbon species, and iron impurities from the plasma system confirmed by X-ray photoelectron spectroscopy analysis.
引用
收藏
页数:14
相关论文