GaInNAs/GaAs multiple quantum wells grown by gas-source molecular beam epitaxy

被引:194
|
作者
Xin, HP [1 ]
Tu, CW [1 ]
机构
[1] Univ Calif San Diego, Dept Elect & Comp Engn, La Jolla, CA 92093 USA
关键词
D O I
10.1063/1.121378
中图分类号
O59 [应用物理学];
学科分类号
摘要
GaInNAs/GaAs multiple quantum wells (MQWs) with different N composition were successfully grown on semi-insulating GaAs substrate by gas-source molecular beam epitaxy. A nitrogen radical beam source was used to incorporate N into GaInAs layers. High resolution x-ray rocking curves measurements indicate that the N composition in GaInNAs layer was increased from 0.009 to 0.03 with increasing N-2 flow rate. Photoluminescence (PL) measurements show that the PL wavelength red shifts with increasing N composition in GaInNAs layer. For a 7-period Ga0.7In0.3N0.02As0.98/GaAs MQW, a PL peak at 1.3 mu m wavelength at room temperature has been successfully obtained. The band offset Delta E-c for Ga0.7In0.3NxAs1-x/GaAs enlarges quickly from 0.26 eV to 0.56 eV with increasing N concentration from 0% to 3%. (C) 1998 American Institute of Physics. [S0003-6951(98)02319-5].
引用
收藏
页码:2442 / 2444
页数:3
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