Anodization-based area reduction process of Nb/Al-AlOx/Nb Josephson junctions

被引：0
|
作者：
Andreone, D [1 ]
Lacquaniti, V
Maggi, S
Monticone, E
Steni, R
机构：
[1] Ist Elettrotecn Nazl Galileo Ferraris, Time & Frequency Dept, Turin, Italy
[2] Ist Elettrotecn Nazl Galileo Ferraris, Thin Film Dept, Turin, Italy
来源：
APPLIED SUPERCONDUCTIVITY 1997, VOLS 1 AND 2: VOL 1: SMALL SCALE AND ELECTRONIC APPLICATIONS; VOL 2: LARGE SCALE AND POWER APPLICATIONS | 1997年 / 158期
关键词：
FABRICATION;
D O I：
暂无
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A fabrication process where controlled anodization is used to reduce the area of Nb/Al-AlOx/Nb Josephson tunnel junctions is presented. This process could be used to fabricate reproducible high-quality submicrometer junctions using photoresist masking pads of several square micrometer. For junctions with an area of 10x10 mu m(2), an edge reduction between 0.5 mu m and 1.75 mu m has been obtained, with a fine dependence on the anodization parameters.
引用
收藏
页码：535 / 538
页数：4
相关论文
共 50 条
  • [21] Nb/Al-AlOx/Nb edge junctions for distributed mixers
    Amos, RS
    Lichtenberger, AW
    Tong, CE
    Blundell, R
    Pan, SK
    Kerr, AR
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 1999, 9 (02) : 3878 - 3881
  • [22] HIGH-QUALITY NB/AL-ALOX/NB JOSEPHSON JUNCTION
    MOROHASHI, S
    SHINOKI, F
    SHOJI, A
    AOYAGI, M
    HAYAKAWA, H
    APPLIED PHYSICS LETTERS, 1985, 46 (12) : 1179 - 1181
  • [23] EXPERIMENTAL INVESTIGATIONS AND ANALYSIS FOR HIGH-QUALITY NB/AL-ALOX/NB JOSEPHSON-JUNCTIONS
    MOROHASHI, S
    HASUO, S
    JOURNAL OF APPLIED PHYSICS, 1987, 61 (10) : 4835 - 4849
  • [24] REACTIVE ION ETCHING OF NB THIN-FILMS FOR NB/AL-ALOX/NB JOSEPHSON TUNNEL-JUNCTIONS
    POPOVA, K
    LEA, WF
    HUTSON, D
    SYDOW, JP
    PEGRUM, CM
    THIN SOLID FILMS, 1994, 239 (02) : 245 - 250
  • [25] Effect of idle region geometry on the magnetic field curves of Nb/Al-AlOx/Nb Josephson junctions
    Lacquaniti, V
    Maggi, S
    Monticone, E
    Steni, R
    APPLIED SUPERCONDUCTIVITY 1997, VOLS 1 AND 2: VOL 1: SMALL SCALE AND ELECTRONIC APPLICATIONS; VOL 2: LARGE SCALE AND POWER APPLICATIONS, 1997, (158): : 543 - 546
  • [26] ULTRAHIGH-SPEED LOGIC GATE FAMILY WITH NB/AL-ALOX/NB JOSEPHSON-JUNCTIONS
    KOTANI, S
    FUJIMAKI, N
    IMAMURA, T
    HASUO, S
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1986, 33 (03) : 379 - 384
  • [27] NB/AL-ALOX/NB JUNCTIONS FOR A 380 GHZ SIS RECEIVER
    FEAUTRIER, P
    HANUS, M
    FEBVRE, P
    SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 1992, 5 (09): : 564 - 568
  • [28] PROPERTIES OF STACKED NB/AL-ALOX/NB TUNNEL-JUNCTIONS
    NEVIRKOVETS, IP
    KOHLSTEDT, H
    HALLMANNS, G
    HEIDEN, C
    SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 1993, 6 (02): : 146 - 149
  • [29] Sub μm Nb/AlOx/Nb Josephson junctions fabricated by anodization techniques
    Dolata, R
    Weimann, T
    Scherer, HJ
    Niemeyer, J
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 1999, 9 (02) : 3255 - 3258
  • [30] Sub μm Nb/AlOx/Nb Josephson junctions fabricated by anodization techniques
    Dolata, Ralf
    Weimann, Thomas
    Scherer, Hans-Joerg
    Niemeyer, Juergen
    IEEE Transactions on Applied Superconductivity, 1999, 9 (2 III): : 3255 - 3258
12345