Atomic structure of an unusual linear defect at the (001)InAs/(001)GaAs epitaxial interface

被引:0
|
作者
Loubradou, M
Bonnet, R
Chen, FR
机构
[1] Ecole Natl Super Electrochim & Electrome Grenoble, Inst Natl Polytech Grenoble, LTPCM, F-38402 St Martin Dheres, France
[2] Natl Tsing Hua Univ, Ctr Mat Sci, HRTEM, Hsinchu, Taiwan
关键词
electron microscopy; InAs; GaAs; epitaxial systems; elasticity;
D O I
10.1002/1096-9918(200008)30:1<616::AID-SIA714>3.0.CO;2-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Three types of linear defects are observed by high-resolution electron microscopy along the InAs/GaAs(001) interface formed by molecular beam epitaxy deposition of InAs (300 nm) on a GaAs substrate: classical 90 degrees and 60 degrees misfit dislocations and an unusual type of linear defect that is a (1 (1) over bar 0) nanofacet extended over similar to 1 nm and bordered by a 60 degrees dislocation (1/2)[101], Extensive numerical simulations show that the total Burgers vector content of the defect, which includes the contributions of the 60 degrees dislocation and that of a dislocation distribution along the nanofacet, is very close to (1/12)[605] or (1/12)[0 (6) over bar 5], according to the sense of the screw component. A comparison between the experimental and calculated elastic displacement fields has been undertaken from image contrast simulations and the theory of dislocation distribution. Copyright (C) 2000 John Wiley & Sons, Ltd.
引用
收藏
页码:616 / 619
页数:4
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