XPS study of CMP mechanisms of NiP coating for hard disk drive substrates

被引：50

作者：

Qi, Zuqiang ^{[1
]}

Lee, Weiming ^{[1
]}

机构：

[1] Shenzhen Kaifa Magnet Recording Co Ltd, R&D Dept, Shenzhen 518035, Peoples R China

来源：

TRIBOLOGY INTERNATIONAL | 2010年 / 43卷 / 04期

关键词：

Chemical mechanical polishing (CMP); X-ray photoelectron spectroscope (XPS); Passivation; SILICA SLURRY; NICKEL; PLANARIZATION; OXIDATION; BEHAVIOR; FILMS; WATER; METAL; MODEL;

D O I：

10.1016/j.triboint.2009.11.007

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

Chemical mechanical polishing (CMP) mechanisms of NiP coating plated on Al-Mg alloy substrates have been investigated with an X-ray photoelectron spectroscope (XPS). The XPS results indicate that after cleaning, the disk surface contains a thin layer of Ni(CH)(2) and P2O3, followed by a thin NiO and P2O3 layer. It is also deduced that during polishing, the disk surface has an oxidization layer with Ni2+ and p(3+) species. The experimental investigations reveal that the CMP mechanisms involve a simultaneous process of surface chemical passivation and nano-particle wear. (C) 2009 Elsevier Ltd. All rights reserved.

引用

页码：810 / 814

页数：5

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