Silicon metal-oxide-semiconductor field effect transistor/field emission array fabricated using chemical mechanical polishing

被引:9
|
作者
Hong, CY [1 ]
Akinwande, AI [1 ]
机构
[1] MIT, Microsyst Technol Labs, Cambridge, MA 02139 USA
来源
关键词
D O I
10.1116/1.1527651
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An integrated lightly doped drain-metal-oxide-semiconductor field effect transistor (LD-MOSFET) is used to control the electron supply of a silicon field emission array (FEA), resulting in low voltage switching and stabilization of emission current. The LD-MOSFET-driven field emission array was fabricated using isotropic and anisotropic etching of silicon, oxidation sharpening, chemical vapor deposition, and chemical mechanical polishing. Current-voltage characterization of the LD-MOSFET-driven FEA demonstrated modulation of electron emission by the MOSFET gate voltage and the reduction of current fluctuation. (C) 2003 American Vacuum Society.
引用
收藏
页码:500 / 505
页数:6
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