Design and Characterization of Arbitrary Filters with an Integrated Spiral Si3N4/SiO2 Waveguide

被引:0
|
作者
Hu, Yiwen [1 ]
Xie, Shengjie [1 ]
Zhan, Jiahao [1 ]
Zhang, Yang [1 ]
Veilleux, Sylvain [2 ]
Dagenais, Mario [1 ]
机构
[1] Univ Maryland, Dept Elect & Comp Engn, College Pk, MD 20742 USA
[2] Univ Maryland, Dept Astron, College Pk, MD 20742 USA
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the optimization of reconstruction algorithm and experiment for an integrated arbitrary filter. A 43-notch filter near 1550 nm is implemented with an ultra-low-loss Si3N4/SiO2 spiral waveguide. All notches have uniform depths/widths of about 20 dB/0.2 nm.
引用
收藏
页数:3
相关论文
共 50 条
  • [31] Study of Si3N4/SiO2/Si and SiO2/Si3N4/Si Multi layers by O and N K-Edge X-ray Absorption Spectroscopy
    Lee, Youn-Seoung
    Lee, Won-Jun
    Kang, Sung-Kyu
    Rha, Sa-Kyun
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (08)
  • [32] Integrated Resonators in an Ultralow Loss Si3N4/SiO2 Platform for Multifunction Applications
    Huffman, Taran Arthur
    Brodnik, Grant M.
    Pinho, Catia
    Gundavarapu, Sarat
    Baney, Douglas
    Blumenthal, Daniel J.
    IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2018, 24 (04)
  • [33] Introduction of atomic H into Si3N4/SiO2/Si stacks
    WEBER K.J.
    BLAKERS A.W.
    Rare Metals, 2006, (S1) : 150 - 152
  • [34] Introduction of atomic H into Si3N4/SiO2/Si stacks
    Jin Hao
    Weber, K. J.
    Li Weitang
    Blakers, A. W.
    RARE METALS, 2006, 25 : 150 - 152
  • [35] Vertically and laterally waveguide-coupled cylindrical microresonators in Si3N4 on SiO2 technology
    D.J.W. Klunder
    E. Krioukov
    F.S. Tan
    T. van der Veen
    H.F. Bulthuis
    G. Sengo
    C. Otto
    H.J.W.M. Hoekstra
    A. Driessen
    Applied Physics B, 2001, 73 : 603 - 608
  • [36] Design and realization of optical filters on an integrated Si3N4 PIC platform
    Roeloffzen, Chris
    Mitsolidou, Charoula
    Pineda, Carlos Ruiz
    Timens, Roelof Bernardus
    Mohammad, Ahmad
    Visscher, Ilka
    Butter, Roel
    Sahin, Furkan
    Maat, Peter
    Kriswandhi, Sesilia
    Klein, Edwin
    Heuvink, Rick
    Dekker, Ronald
    van Dijk, Paul
    2024 IEEE PHOTONICS SOCIETY SUMMER TOPICALS MEETING SERIES, SUM 2024, 2024,
  • [37] Si3N4和Si3N4/SiO2驻极体薄膜的化学表面修正
    张晓青
    夏钟福
    潘永刚
    同济大学学报(自然科学版), 2000, (05) : 564 - 567
  • [38] SELECTIVE SPUTTER-ETCHING OF SIO2 AND SI3N4
    KUROGI, Y
    TAJIMA, M
    MORI, K
    SUGIBUCHI, K
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (08) : C284 - C284
  • [39] Stabilization of positive charge in SiO2/Si3N4 electrets
    Leonov, V.
    Fiorini, P.
    Van Hoof, C.
    IEEE TRANSACTIONS ON DIELECTRICS AND ELECTRICAL INSULATION, 2006, 13 (05) : 1049 - 1056
  • [40] Numerical simulation of intrinsic defects in SiO2 and Si3N4
    Gritsenko, VA
    Novikov, YN
    Shaposhnikov, AV
    Morokov, YN
    SEMICONDUCTORS, 2001, 35 (09) : 997 - 1005