Study on Optoelectronic Characteristics of ZnGa2O4 Thin-Film Phototransistors

被引:36
|
作者
Shen, Yuan-Chu [1 ]
Tung, Chun-Yi [1 ]
Huang, Chiung-Yi [1 ]
Lin, Yu-Chang [2 ]
Lin, Yan-Gu [2 ]
Horng, Ray-Hua [1 ,3 ]
机构
[1] Natl Chiao Tung Univ, Inst Elect, Hsinchu 300, Taiwan
[2] Natl Synchrotron Radiat Res Ctr, Hsinchu 300, Taiwan
[3] Natl Chiao Tung Univ, Ctr Emergent Funct Matter Sci, Hsinchu 300, Taiwan
关键词
ZnGa2O4; DUV phototransistors; photodetectors; phototransistors; metal-organic chemical-vapor deposition; ULTRAVIOLET PHOTODETECTORS; PERFORMANCE;
D O I
10.1021/acsaelm.9b00128
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Deep ultraviolet (DUV) phototransistors with high photoresponsivity are fabricated on ZnGa2O4 grown by metal-organic chemical-vapor deposition. Owing to transistor actions, the photodetector meets to a large photocurrent and optical response. When illuminated with photon wavelength within the range of 200-250 nm, the ZnGa2O4-based phototransistor presented a large responsivity, especially 1.51 X 10(6) A/W as the incident light at 210 nm with 1.73 mu W/cm(2). It was also observed that the photocurrent/dark current ratio and rising time can be improved by gate control, which is related to threshold voltage shifting when under illumination. These results demonstrate ZnGa2O4 based phototransistor is a very promising candidate for DUV optoelectronic devices applications.
引用
收藏
页码:783 / 788
页数:11
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