Plasma physics of ECR ion sources

被引：0
|
作者：
Girard, A
机构：
来源：
VIDE-SCIENCE TECHNIQUE ET APPLICATIONS | 2002年 / 57卷 / 306期
关键词：
multiply charged ions; ECR plasma; cyclotron resonance; mirror confinement; Fokker-Planck equation;
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Electron Cyclotron Resonance (ECR) Ion Sources are scientific instruments particularly useful for physics. Besides their extensive use in Atomic, Nuclear, and High Energy Physics, these sources are also of fundamental interest for plasma physicists, because of the very particular properties of the ECR plasma. This article describes the state of the art on the physics of the ECR plasma related to. multiply charged ion sources. After a short introduction, chapter "Gineralitis, description des sources d'ions RCE", describes the bases of ECR Ion Sources. Physics related to the Electron Population is presented in chapter "La physique des electrons" : heating and confinement are discussed. The next chapter "La physique des ions" addresses the problem of ion production and confinement. Some particular and important effects, specific to ECR Ion Sources, are discussed in chapter "Divers effets remarquables". In the last chapter, technological aspects of ECR are presented and different types of sources are shown.
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页码：775 / +
页数：36
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