A new generation of power unipolar devices:: the concept of the FLoating islands MOS transistor (FLIMOST)

被引:33
|
作者
Cézac, N [1 ]
Morancho, F [1 ]
Rossel, P [1 ]
Tranduc, H [1 ]
Peyre-Lavigne, A [1 ]
机构
[1] CNRS, LAAS, F-31077 Toulouse 4, France
关键词
D O I
10.1109/ISPSD.2000.856775
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, a new vertical DMOS Transistor is proposed, in which floating islands are placed in the drift region. This new structure, called "FLIMOST", exhibits improved on-state performance when compared to the conventional VDMOST. For instance, for a breakdown voltage of 900 Volts, the performance is strongly improved in term of specific on-resistance (reduction of about 70% relative to the conventional structure and 40% relative to the silicon limit). Moreover the specific on-resistance theoretical limits of FLIMOST family are determined and compared to those of the "Superjonction" MOS Transistor family : this comparison shows the strong interest of the FLIMOSFET in the 200 V - 1000 V breakdown voltage range.
引用
收藏
页码:69 / 72
页数:4
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