n-Si/SiO2/Si heterostructure barrier varactor diode design

被引:7
|
作者
Fu, Y
Mamor, M
Willander, M
Bengtsson, S
Dillner, L
机构
[1] Univ Gothenburg, Dept Phys, S-41296 Gothenburg, Sweden
[2] Chalmers Univ Technol, Dept Microelect ED, Solid State Elect Lab, S-41296 Gothenburg, Sweden
[3] Univ Gothenburg, Dept Microwave Technol, S-41296 Gothenburg, Sweden
关键词
D O I
10.1063/1.126891
中图分类号
O59 [应用物理学];
学科分类号
摘要
Symmetric C-V and antisymmetric I-V characteristics are essential for a heterostructure barrier varactor (HBV) to generate odd harmonics in a frequency multiplier. Practically high multiplier efficiency is obtained when the shape of the C-V characteristic is sharp near zero bias and the conduction current is low. Here we present the design of an n-type Si/SiO2/Si-based HBV and its state-of-the-art device performance. Self-consistent solutions of the Schrodinger and Poisson equations show a drastic decrease of the conduction current due to the large electron effective mass and the SiO2 barrier height. The shape of the C-V curve can be easily tuned by modifying the thickness of the SiO2 layer. By the techniques compatible with the conventional Si technology, a Si/SiO2/Si varactor junction (having a SiO2 layer of 20 nm) has been processed and the device characteristics are very promising. (C) 2000 American Institute of Physics. [S0003-6951(00)01827-1].
引用
收藏
页码:103 / 105
页数:3
相关论文
共 50 条
  • [1] Negative capacitance in Au/CuInGaSe2/SiO2/n-Si/Al Schottky barrier diode devices
    Ashery, A.
    Gaballah, A. E. H.
    Kabatas, Mohamed A. Basyooni-M.
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2024, 26 (36) : 23951 - 23961
  • [3] Leakage current and capacitance characteristics of Si/SiO2/Si single-barrier varactor
    Mamor, M
    Fu, Y
    Nur, O
    Willander, M
    Bengtsson, S
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2001, 72 (05): : 633 - 637
  • [4] Leakage current and capacitance characteristics of Si/SiO2/Si single-barrier varactor
    M. Mamor
    Y. Fu
    O. Nur
    M. Willander
    S. Bengtsson
    Applied Physics A, 2001, 72 : 633 - 637
  • [5] Heterojunction Al/SiO2/n-Si device as an Auger transistor
    Ostroumova, EV
    Rogachev, AA
    FUNDAMENTAL ASPECTS OF ULTRATHIN DIELECTRICS ON SI-BASED DEVICES, 1998, 47 : 383 - 390
  • [6] Photoluminescence from(Si/SiO2)n superlattices and their use as emitters in [SiO2/Si]n SiO2[Si/SiO2]m microcavities
    Pucker, G
    Bellutti, P
    Pavesi, L
    SPECTROCHIMICA ACTA PART A-MOLECULAR AND BIOMOLECULAR SPECTROSCOPY, 2001, 57 (10) : 2019 - 2028
  • [7] Defects induced by hydrogen implantation in n-Si/SiO2 structures
    Simeonov, S
    Gushterov, A
    Szekeres, A
    Kafedjiiska, E
    VACUUM, 2004, 76 (2-3) : 303 - 306
  • [8] The barrier height enhancement of the Au/n-Si/Al Schottky barrier diode by electrochemically formed an organic Anthracene layer on n-Si
    Caldiran, Z.
    Deniz, A. R.
    Aydogan, S.
    Yesildag, A.
    Ekinci, D.
    SUPERLATTICES AND MICROSTRUCTURES, 2013, 56 : 45 - 54
  • [9] Isotype surface-barrier n-TiN/n-Si heterostructure
    M. N. Solovan
    V. V. Brus
    P. D. Maryanchuk
    Semiconductors, 2014, 48 : 219 - 223
  • [10] Isotype surface-barrier n-TiN/n-Si heterostructure
    Solovan, M. N.
    Brus, V. V.
    Maryanchuk, P. D.
    SEMICONDUCTORS, 2014, 48 (02) : 219 - 223