Annealing atmosphere effects on Zn nanoparticles in SiO2 and transformation to ZnO nanoparticles

被引:9
|
作者
Amekura, H.
Plaksin, O. A.
Kishimoto, N.
Buchal, Ch.
机构
[1] Natl Inst Mat Sci, Quantum Beam Ctr, Tsukuba, Ibaraki 3050003, Japan
[2] Forschungszentrum Julich, Inst Schichten & Grenzflaechen ISGI IT, D-52425 Julich, Germany
来源
SURFACE & COATINGS TECHNOLOGY | 2007年 / 201卷 / 19-20期
关键词
nanoparticle; ion implantation; Zn; oxidation;
D O I
10.1016/j.surfcoat.2006.01.081
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effects of annealing atmosphere (oxygen or vacuum) on Zn nanoparticles (NPs) embedded in SiO2 fabricated by ion implantation are studied. The oxidation effect depends on the ratio of the diffusion length of O-2 molecules in the substrates to the projectile range of implanted ions. Up to 400 degrees C, annealing for I h in oxygen and vacuum induces almost the same increase of the optical absorption band of Zn NPs at similar to 5 eV. In this temperature range, the diffusion length of O-2 molecules is less than similar to 1 nm, i.e., much shorter than the projectile range. After annealing at 600 degrees C for 1 h, the vacuum atmosphere increases but the oxygen atmosphere decreases the absorption band of Zn NPs. At 600 degrees C, some fraction of Zn NPs transforms to ZnO NPs under the oxygen atmosphere since the diffusion length of O-2 molecules increases to similar to 10 nm. Annealing in oxygen at 700 degrees C for 1 h gives rise to a complete transformation of Zn NPs to ZnO NPs, since the diffusion length increases to similar to 30 nm, which is comparable to the projectile range. Similar results are also observed for Ni NPs and Cu NPs in the same temperature range, supporting the diffusion controlled oxidation of the NPs in SiO2 (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:8215 / 8219
页数:5
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