Oriented growth of Bi3.25La0.75Ti3O12 thin films on RuO2/SiO2/Si substrates by using the polymeric precursor method:: Structural, microstructural and electrical properties

被引:0
|
作者
Simoes, A. Z.
Ramirez, M. A.
Riccardi, C. S.
Longo, E.
Varela, J. A.
机构
[1] Univ Estadual Paulista, UNESP, Inst Chem, BR-14801970 Araraquara, SP, Brazil
[2] Univ Fed Sao Carlos, Dept Chem, BR-13560905 Sao Carlos, SP, Brazil
[3] Univ Estadual Paulista, UNESP, BR-1703336 Bauru, SP, Brazil
基金
巴西圣保罗研究基金会;
关键词
thin films; atomic force microscopy; dielectric properties; fatigue;
D O I
10.1007/s10832-007-9006-9
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
c-axis oriented Bi3.25La0.75Ti3O12 (BLT) thin films were grown on a RuO2 top electrode deposited on a (100) SiO2/Si substrate by the polymeric precursor method. X-ray diffraction and atomic force microscope investigations indicate that the films exhibit a dense, well crystallized microstructure having random orientations with a rather smooth surface morphology. The electrical properties of preferred oriented Bi3.25La0.75Ti3O12 (BLT) thin films deposited on RuO2 bottom electrode leaded to a large remnant polarization (P-r ) of 17.2 mu C/cm(2) and (V-c ) of 1.8 V, fatigue free characteristics up to 10(10) switching cycles and a current density of 2.2 mu A/cm(2) at 5 V. We found that the polarization loss is insignificant with nine write/read voltages at a waiting time of 10,000 s. Independently of the applied electric field the retained switchable polarization approached a nearly steady-state value after a retention time of 10 s.
引用
收藏
页码:39 / 43
页数:5
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