Application of thin-film amorphous silicon to chemical imaging

被引：0
|
作者：
Yoshinobu, Tatsuo
Moritz, Werner
Finger, Friedhelm
Schoening, Michael J.
机构：
[1] Tohoku Univ, Dept Elect Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan
[2] Humboldt Univ, D-12489 Berlin, Germany
[3] Res Ctr Juelich, D-52425 Julich, Germany
[4] Univ Appl Sci Aachen, Div Juelich, D-52428 Julich, Germany
来源：
Amorphous and Polycrystalline Thin-Film Silicon Science and Technology 2006 | 2007年 / 910卷
关键词：
D O I：
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A thin-film amorphous silicon (a-Si) deposited on a glass substrate was employed as a semiconductor material for the chemical imaging sensor, which can visualize the distribution of ion concentration in a solution. The sensing properties and the spatial resolution of the a-Si sensors were investigated. Nearly-Nernstian pH sensitivities and submicron resolution were demonstrated, which suggests the superior performance of the chemical imaging sensor based on thin-film a-Si.
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页码：481 / 490
页数：10
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