On the mechanism of electrical conduction in plasma polymerized furan films

被引：10
|
作者：
Kumar, DS [1 ]
机构：
[1] CMS Coll, Dept Phys, George Sudarshan Ctr Phys & Comp Sci, Kottayam 686001, Kerala, India
来源：
JOURNAL OF MATERIALS SCIENCE | 2000年 / 35卷 / 17期
关键词：
D O I：
10.1023/A:1004873410933
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Dark conduction in radio frequency plasma polymerized Furan thin film is reported. A contact limited Schottky mechanism is found to predominate. A comparison of the value from different experimental studies and the value from theoretical studies confirm the Schottky type mechanism in Furan thin film. (C) 2000 Kluwer Academic Publishers.
引用
收藏
页码：4427 / 4430
页数：4
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